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RTP EO Cell


RTP is an ideal material for a wide variety of Electro-Optic applications as Pockels cells, shutters, Q-switch, phase modulators, attenuators, pulse pickers and more. The crystal is transparent at most common visible and near infrared laser wavelengths.

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RTP EO Cell

RTP is an ideal material for a wide variety of Electro-Optic applications as Pockels cells, shutters, Q-switch, phase modulators, attenuators, pulse pickers and more. The crystal is transparent at most common visible and near infrared laser wavelengths.

RTP based EO devices are offered in matched pair configurations and in temperature compensating designs. RTP EO cells are assembled in a thermally compensated double-crystal configuration, in which two matched crystals are placed in line of the propagation axis (x or Y) with one rotated by 90 degrees.

Product Types

Matched pair of RTP Elements

Single RTP Element used for phase modulators)

Plug and play, Electro-optical cells assembly (with / without housing)

Main Features

Low half-wave voltage of EO Cells to enable a compact design

Rise time, fall time, and pulse width of 1 ns to enable fast operation

Designed to operate over a wide temperature range (-50°C to 70°C)

The best material in the spectral range of 500-3000 nm for electro-optics applications

High laser-induced damage threshold (up to1000 MW/cm2, at 1064 nm, 10 ns pulse)

Very low absorption losses at 1064 nm wavelength

Extremely high homogeneity: up to 15*15 mm EO cells as a standard size

Non-hygroscopic, easy handling, no cover needed

Minimal ringing, compatible for 1 MHz repetition rate

 

 

Specifications
Operational Rang500~3000 nm
Transmission@ 1064 nm > 99%
Half Wave Voltage3.6 kV (for EO cells size 9*9*10 mm3)
Extinction Ratio> 20 dB @633nm
Clear Aperture1.5×1.5 mm² to 15×15 mm²
Crystal LengthUp to 50 mm
Acceptance Angle<4 deg
StandardAR Coating @1064 nm, R < 0.2 %
Laser Induced Damage ThresholdUp to 1 GW/cm², @1064 nm, 10 ns pulse or 10J/cm²

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