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RTP EO Cell
RTP is an ideal material for a wide variety of Electro-Optic applications as Pockels cells, shutters, Q-switch, phase modulators, attenuators, pulse pickers and more. The crystal is transparent at most common visible and near infrared laser wavelengths.
Classification:
Detailed introduction
RTP EO Cell
RTP is an ideal material for a wide variety of Electro-Optic applications as Pockels cells, shutters, Q-switch, phase modulators, attenuators, pulse pickers and more. The crystal is transparent at most common visible and near infrared laser wavelengths.
RTP based EO devices are offered in matched pair configurations and in temperature compensating designs. RTP EO cells are assembled in a thermally compensated double-crystal configuration, in which two matched crystals are placed in line of the propagation axis (x or Y) with one rotated by 90 degrees.
Product Types
Matched pair of RTP Elements
Single RTP Element used for phase modulators)
Plug and play, Electro-optical cells assembly (with / without housing)
Main Features
Low half-wave voltage of EO Cells to enable a compact design
Rise time, fall time, and pulse width of 1 ns to enable fast operation
Designed to operate over a wide temperature range (-50°C to 70°C)
The best material in the spectral range of 500-3000 nm for electro-optics applications
High laser-induced damage threshold (up to1000 MW/cm2, at 1064 nm, 10 ns pulse)
Very low absorption losses at 1064 nm wavelength
Extremely high homogeneity: up to 15*15 mm EO cells as a standard size
Non-hygroscopic, easy handling, no cover needed
Minimal ringing, compatible for 1 MHz repetition rate
Specifications | |
Operational Rang | 500~3000 nm |
Transmission | @ 1064 nm > 99% |
Half Wave Voltage | 3.6 kV (for EO cells size 9*9*10 mm3) |
Extinction Ratio | > 20 dB @633nm |
Clear Aperture | 1.5×1.5 mm² to 15×15 mm² |
Crystal Length | Up to 50 mm |
Acceptance Angle | <4 deg |
Standard | AR Coating @1064 nm, R < 0.2 % |
Laser Induced Damage Threshold | Up to 1 GW/cm², @1064 nm, 10 ns pulse or 10J/cm² |
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